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IEC 63229

IEC 63229:2021
Semiconductor devices - Classification of defects in gallium nitride epitaxial film on silicon carbide substrate
IEC 63229:2021(E) gives guidelines for the definition and classification of defects in GaN epitaxial film grown on SiC substrate. They are identified and described on the basis of examples, mainly by schematic illustrations, optical microscope images, and transmission electron microscope images for these defects. This document covers only defects in as-grown GaN epitaxial film on SiC substrate and does not include defects caused by subsequent processes.
BASE PUBLICATION
English
  CHF 155.-

Technical committee

TC 47 Semiconductor devices
Publication typeInternational Standard
Publication date2021-04-07
Edition1.0
ICS

31.080.99

Stability date2031
ISBN number9782832296691
Pages21
File size2.64 MB
EditionDatePublicationEditionStatus
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