IEC 62047-2:2006 

Semiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing method of thin film materials

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Abstract

Specifies the method for tensile testing of thin film materials with length and width under 1 mm and thickness under 10 m, which are main structural materials for micro-electromechanical systems (MEMS), micromachines and similar devices. The main structural materials for MEMS, micromachines and similar devices have special features such as typical dimensions in the order of a few microns, a material fabrication by deposition, and a test piece fabrication by non-mechanical machining using etching and photolithography. This International Standard specifies the testing method, which enables a guarantee of accuracy corresponding to the special features.

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Additional information

Publication typeInternational Standard
Publication date2006-08-15
Edition1.0
Available language(s)English/French
TC/SCTC 47/SC 47F - Micro-electromechanical systemsrss
ICS31.080.99 - Other semiconductor devices
Stability date  2023
Pages25
File size449 KB

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